PHOSPHORUS IMPLANT IN SILICON DEPTH PROF

Code: NIST2133 D2-231

General description

This Standard Reference Material (SRM) is intended for use in calibrating secondary ion response to minor and trace levels of phosphorus in a silicon matr...


read more

Your Price
€3,856.80 EACH
€4,743.86 inc. VAT

General description

This Standard Reference Material (SRM) is intended for use in calibrating secondary ion response to minor and trace levels of phosphorus in a silicon matrix by the analytical technique of secondary ion mass spectrometry (SIMS). SRM 2133 is intended for calibrating the response of a SIMS instrument for phosphorus in a silicon matrix under a specific set of instrumental conditions. It may also be used by a laboratory as a transfer standard for the calibration of working standards of phosphorus in silicon. This SRM consists of a 1 cm × 1 cm single crystal silicon substrate that has been ion-implanted with the isotope 31P at a nominal energy of 100 keV. For more information, please refer to the COA and SDS.SRM 2133_cert SRM 2133 _SDS

Legal Information

NIST is a registered trademark of National Institute of Standards and Technology

SRM is a registered trademark of National Institute of Standards and Technology

application(s)pharmaceutical (small molecule)
formatmatrix material
gradecertified reference material
manufacturer/tradenameNIST®
packagingpkg of each
Quality Level100
This product has met the following criteria to qualify for the following awards:



PROCEED TO CHECKOUT

HAVE AN ACCOUNT? LOGIN


GUEST CHECKOUT

Proceed as a guest. You will have the option to register to access exclusive pricing and stock availability features after checkout.